There are several types of vacuum thin film coatings. Among them, there is a sputtering method using plasma energy. Batch type Sputter is applied in semiconductor process and display process using wafers or glass. Since the late 1990s, roll to roll sputtering has been applied to industry. The substrate is wound. Thin glass or film was substrate material. Initially, ITO was coated and the application range of sputter coating is gradually widening. Functional coating by sputtering acts as barrier, optical control, color control and so on.
We will explain the advantages and disadvantages of roll-to-roll sputtering and discuss the prospects about sputter.